60 kW Medium Frequency Magnetron Sputtering Coating Plasma Power PECVD MFG4

60 kW Medium Frequency Magnetron Sputtering Coating Plasma Power PECVD MFG4

The unit is dedicated to the PECVD film formation of photovoltaic cell tubes, depositing nano-silicon nitride films on the surface of silicon wafers.

* New generation Sic devices > 12x reliability 4x faster MOSFET thermal conductivity; < 1% power failure

* The power transformer is made of nanocrystalline magnetic core material: extremely high magnetic permeability; high saturation magnetic induction; low loss; wide frequency characteristics, small magnetic leakage; small size; easy winding, easy control of withstand voltage, failure risk < 1

* Arc suppression management

When I-Arc is detected, the power can be cut off and restarted within < 10ms.

Control adjustment starts within < 1 μs when V-Arc is detected

Residual Arc energy < 1mJ/kw, prevent sticking point scorch; improve yield; sticking point scorch < 0.16%

* Sic device adopts large water cooling system + auxiliary air cooling design

Multiple temperature control monitoring and protection, compared with imported products, the temperature is 4 to 6 degrees lower, and the power density of the same size is more than 10%.

* Configuration panel operation and Modbus communication; dual operation and monitoring, communication protocol compatible with TruMRF, easy to install quickly, connect equipment PLC, easy to operate.