English 
简体中文 
20 KW Medium Frequency Power Supply PECVD MFG4
Mid Frequency Power Supply
This unit is used for double cathode sputtering of metal or semiconductor materials, especially suitable for reactive magnetron sputtering, oxide nitride, carbide films to increase the ionization rate.
30KW 40KHz Mid Frequency Vacuum Deposition Sputtering Plasma Power Supply
30KW 40KHz Mid Frequency Vacuum Deposition Sputtering Plasma Power Supply
PEII Sine Wave Mid Frequency Sputter Power Supply
PEII sine wave intermediate frequency power supply
MF Square Wave Intermediate Frequency Sputtering Power Supply
This unit is used for double cathode sputtering of metal or semiconductor materials, especially suitable for reactive magnetron sputtering, oxide nitride, carbide films to increase the ionization rate.
60 kW Medium Frequency Magnetron Sputtering Coating Plasma Power PECVD MFG4
60 kW Medium Frequency Magnetron Sputtering Coating Plasma Power PECVD MFG4
30 KW Mid Frequency Magnetron Sputtering Power Supply PECVD MFG4
30 KW Mid Frequency Magnetron Sputtering Power Supply PECVD MFG4